ALD Solutions for Compound Semiconductor Devices

Plasma Effects on the Epitaxial Growth of Aluminum Nitride Thin Films on (0001)4H-SiC by PE-ALD

Novel Low Temperature Thermal ALD of Aluminum Nitride Utilizing a Non-Metal Catalyst

Thermal and Plasma Enhanced ALD growth of functional Al₂O₃/AlN dielectric stacks for silicon carbide MOSFETs

Reduction of Defects at or Near ALD-Al₂O₃/GaN Interfaces for Improved Electrical Performance of GaN Power Devices

Fabrication of RuS2 Photodetector Via Post Sulfurization of Atomic Layer Deposition Ru Thin Film

Spatial Atomic Layer Deposition: A New Revolution in Ultra-Fast Production of Conformal and High-Quality Optical Coatings

Deposition and Characterization of Electro-Optic ALD K(Ta_X,Nb_1-X)O₃ Films for Photonics

Advances in Plasma-based Atomic Layer Processing of AlF₃ for the Passivation of FUV Mirrors

Plasma-Enhanced Atomic Layer Deposition with RF Substrate Biasing to Tune the Performance of Superconducting Nanowire Single-Photon Detectors in the Mid-Infrared

Atomic Layer Deposition for Stable On-Chip Quantum Dot LEDs: Hybrid Quantum Dot Pockets

A Comparative Study on Cation distribution effects in Heterogeneous channel IGZO TFTs via Atomic Layer Deposition Supercycle Design

Characteristics of PEALD IGZO Films Using Tetrahydrofuran-Adducted In & Ga Precursors

Triggering Nucleation of Pt ALD through UV-illumination

Reaction Pathway of Copper Atomic Layer Deposition via Time-of-Flight Mass Spectrometry

in vacuo Cluster Tool for Studying Reaction Mechanisms in ALD and ALE Processes

Understanding the Dual-Source Behavior of LiHMDS for Si-Free Li-Containing Films

Combining in Situ Photoluminescence and Ellipsometry : A New Approach to Analyse and Optimize Ald Materials for Photovoltaic Applications

Self-Limiting Deposition of Copper from Copper Beta-Diketonates and Plasma Electrons

Exploring Nucleation Phenomena in Ultra-Thin ALD and PE-Ald Films on NMC 811 Substrates: An in Situ Quartz Crystal Microbalance Study

The Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe₃ and O₂/O₃/O₂-Plasma

In vacuo XPS Growth Studies During ALD of ErNiO₃

Surface Chemistry of Aluminum Nitride ALD

Investigating Hf Oxide Growth with Ambient Pressure XPS and Ozone as Co-Reactant

ALD/ALE 2024 Closing Remarks

UHP PEALD Growth and High Field Dielectric Testing of κ-Ga₂O₃ Films

Crystalline Phase Control of Manganese Oxide Films by Plasma Enhanced Atomic Layer Deposition

Superconducting Ultrathin Niobium Nitride Films for Quantum Application

Modeling of Plasma-Assisted Cryogenic Etching of SiO₂

Utilizing Thermodynamic Analysis to Screen Material and Precursor Selection for Selective Thermal Atomic Layer Etching

Atomistic Surface Processing Simulations: ALE of Transition Metal Dichalcogenides

Gas-Phase Etching Mechanism of Amorphous Hydrogenated Silicon Nitride by Hydrogen Fluoride: A Theoretical Study

Dynamic Global Model of Cl₂/Ar Plasmas for Atomic Layer Etching of GaN

A Transient Surface Site Balance Model for Si-Cl2-Ar Atomic Layer Etching

Theoretical Analysis on Halogenation of Transition Metal Surfaces toward Thermal Atomic Layer Etching

Atomic-Scale Homogeneous PtRu Alloy Thin Films Prepared by Atomic Layer Modulation (ALM)

A New Approach to the Synthesis of Nb@TiO₂ Core-Shell Composite for Oxide Dispersion Strengthened Alloy via Atomic Layer Deposition

Influence of an Artificial Structure on the Mechanical Properties of Atomic Layer Deposited Al₂O₃ and Ta₂O₅ Composite Thin Films

Phosphorus-Rich Metal Phosphide Thin Films Using Zintl Ions

Improved Crystallinity and Polarity Determination of Gallium Nitride on Si (111) Using Atomic Layer Annealing

Self-limiting Epitaxy of GaN and InN Films on Sapphire Substrates

Epitaxial Rare-Earth Orthoferrites by Atomic Layer Deposition

Area Selectivity and Crystallographic Orientation of ZIF-8 Films Deposited by Molecular Layer Deposition