New Ion Beam Technologies for Imaging, Sample Preparation and Analysis (AS-WeM)
Wednesday, Oct 20 2010 8:00AM, Room Cochiti
Moderated by: Joseph A. Gardella, Jr., SUNY at Buffalo
Abstracts (Use Expand/Collapse to see/hide details)
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8:00 AMAS-WeM-1Ion Photon Emission Microscopy: A Novel Method for Studying Radiation Effects
8:20 AMAS-WeM-2Synthesis and Characterization of Gold Nanocluster-Cavity Pairs in SrTiO3
8:40 AMAS-WeM-3Development of Regular Arrays of Nanometer-Sized Metallic Features using a Mask of Ion Beam Modified Silica Particles
9:00 AMAS-WeM-4Material Contrast Mechanisms in FIB and SEM Images
9:20 AMAS-WeM-5A High Brightness Plasma Source for Next Generation FIB, SIMS and Surface Engineering
10:40 AMAS-WeM-9XPS Comparison of Ar, Coronene, C60, and Ar Gas Cluster Ion Beam Depth Profiling of Polyimide Films
11:00 AMAS-WeM-10XPS Sputter Depth Profiling of Organic Materials Using a Coronene Ion Source
11:20 AMAS-WeM-11The Application of Digital Techniques to the Calibration of Depth Scales in XPS Sputter Profiling
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