ALD/ALE 2021 Monday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details. Click a Session in the first column to view session papers.
| Session | Monday, June 28, 2021 | ||||||||||||||||||||||||||||||||||||||||||||||||
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| 10:00 AM | 11:00 AM | 12:00 PM | 1:00 PM | ||||||||||||||||||||||||||||||||||||||||||||||
| LI-MoM |
Opening Remarks & Welcome
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Plenary Lecture: Materials & Innovation - Essential Elements that Underpin the Next Industrial Revolution
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Introduction to ALD and ALE Student Finalists
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ALD Student Award Finalist Talk: Enhanced Surface Adsorption in Electric Field/Potential Assisted Atomic Layer Deposition (EA-ALD) of Ultrathin Ru Film
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BREAK
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ALD Student Award Finalist Talk: What Controls the Conformality of Plasma ALD in High-Aspect-Ratio Applications?
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ALE Student Award Finalist Talk: Modelling Atomic Layer Etching of Thin Film Metal Oxides
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ALD Student Award Finalist Talk: Surface Passivation Using Aminosilanes for Area-Selective Atomic Layer Deposition
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ALD Student Award Finalist Talk: Electron-Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using (DMBD)Ru(CO)3
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Plenary Lecture: Mechanisms of Thermal Atomic Layer Etching
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BREAK
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Introduction to 2021 ALD Innovator Awardee Stacey Bent, Stanford University, USA: Up, Down and All Around: Controlling Atomic Placement in ALD
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ALD Student Award Finalist Talk: Tuning Properties of Vapor Deposited ZIF-8 Thin Films With Preferred Orientation
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ALE Student Award Finalist Talk: Reaction Pathways Leading to Anisotropic Pattering of Cu
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ALE Student Award Finalist Talk: Thermal Atomic Layer Etching of Cobalt Using SO2Cl2 and P(CH3)3
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ALD Student Award Finalist Talk: Insight into Film Growth Mechanisms in Polyurea Molecular Layer Deposition (MLD) Using New and Combined Precursors
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Closing Remarks & Thank Yous
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