ALD/ALE 2025 Tuesday Afternoon

Characteristics of ALD IGZO for the application in Stackable DRAM Cell

5 nm Thick Indium Nitride Channel Layers Fabricated by PEALD for 3D Transistor Architectures

Bottom-Up Mo Fill for Metal Interconnect Applications: Selective and Superconformal Approaches

Thermal Atomic Layer Deposition of Sn-incorporated MoO₂ Electrode Films for High-performance TiO₂-based DRAM Capacitors

Highly Ordered Crystalline ALD-InGaO Thin Films with High Mobility and Thermal Stability for Next-Generation 3D Memory Devices

Amino Acid-Based BiomimeticOrganic-Inorganic Hybrid Memristors by Molecular Layer Deposition for Neuromorphic Applications

Design of Crystalline InGaO Channels with High-Temperature Stability via Thermal ALD Process Parameter Variations

Interface Evolution in ALD of HfO₂ on TiN: LEIS and XPS in Vacuo Studies

Development of a Home-Built Atomic Layer Deposition Reactor for in-Situ Synchrotron GISAXS and XAS Characterization 

Evaluation of Initial Nucleation of Co-ALD by CCTBA Using in-Situ Reflectance Monitoring and Atomistic Simulator Based on Neural Network Potential

Low Energy Ion Scattering Analysis of GC/IrOX /SiO₂ Layer Structure

Tailoring Interface and Bulk Properties: An Oxidant Co-Dosing Approach to ALD Growth of Hafnia Thin Films

Mechanical Properties and Wear Resistance of Atomic Layer Deposited Ternary Cr-Hf-O Films: A Comparative Study with Binary Chromium Oxide and Hafnium Oxide Films

In-situ X-ray photoelectron spectroscopy for determining oxidation state, composition, and morphology of ALD-based CeO_x, SnO_x, and Ce_xSn_1-xO_y deposits

Controlling the Crystalline Nature of PEALD Thin Films Through Tuning of Plasma Characteristics

Comparative Study of CeO₂ Thin Films Prepared by Plasma-Enhanced and Thermal Atomic Layer Deposition Using a New Liquid Ce Precursor

Tuning Crystallinity of Plasma-Enhanced Atomic Layer Deposited Aluminum Nitride Thin Films using an Electron Cyclotron Resonance Microwave Source

Plasma-Enhanced Atomic Layer Deposition of High-Quality InN Thin Films Using a Novel In Precursor and NH₃ Plasma

Insights Into Tuning TiO₂ Film Property Distribution in 3D Structures During Peald Process

Plasma-Enhanced ALD Process for Boron Carbide Films: Towards Tunable B:C Ratio

Isotropic and Anisotropic ALE: Tool Aspects, Processes, and Applications

Study on Plasma Induced Damaged Layer Formation Using Molecular Dynamics

Theoretical Analysis on Crystalline Phase-Dependent Surface Fluorination of HfO₂ for Atomic Layer Etching

Removal Reaction Mechanisms During Thermal Atomic Layer Etching of Aluminum Oxide: A First-Principles Study

Multiscale Modeling of Gallium Nitride Atomic Layer Etching in Chlorinated Plasmas: A Combined Dynamic Global Model, Ab-initio and Kinetic Monte Carlo Approaches

Characteristics of the Power Delivery System of Transformer-Coupled Plasma Source for Remote Plasma Process in Semiconductor Manufacturing

Cryogenic Atomic Layer Etching of SiO₂ by Physisorption of HF/C₂H₅OH and Ar Plasmas

Development of an Atomic Layer Etching Process Dedicated to Diamond Material

Atomic Layer Etching of MgO-doped Lithium Niobate Using Sequential Plasma Exposures

Comparison of Gas-Pulsing Atomic Layer Etching (ALE) Characteristics Between Low-GWP Alternative Gases C₄F₆, C₄H₂F₆ and a Conventional Gas C₄F₈

Ale of Tin Using Sf₆:H₂ Plasma: The Role of H, F, and Hf in Defining the Ale Window

Atomic Layer Etching of Ruthenium Using Surface Oxidation with O₂ Plasma and Chelation with Formic Acid

Surface Chemistry Characterization for Area-Selective Atomic Layer Deposition of Ruthenium

Area-Selective Solid-State Synthesis of Nickel Silicide Nanostructures

ALD Outstanding Presentation Award Finalist: High Temperature Area Selective ALD SiN by in-Situ Selective Surface Fluorination

Mutifunctional Ru/ZnO Bilayer for Sustainable Cu Interconnects using Area-Selective Atomic Layer Deposition of barrier with Small Molecule Inhibitor

Vapor Phase Infiltration for Membrane Modification

Dry Developing Process of Molecular Layer Deposited Hf-Based Hybrid Thin Films for EUV Lithography

ALD Young Investigator Award Finalist: Inverted Living Molecular Layer Deposition: Rapid Conformal Polymer Coatings through Vapor-Phase Living Polymerization

ALD Outstanding Presentation Award Finalist: Recent Advancement of Inorganic-Organic Hybrid Resist Thin Films Deposited via Molecular Atomic Layer Deposition for Dry EUV Resist Platforms

ALD Young Investigator Award Finalist: Rethinking Thermoelectrics: The „Power” of Hybrids Engineered by Vapor Phase Infiltration

Plasma-Pretreated ALD Growth of Platinum Catalysts on Carbon Nanotubes for Polymer Electrolyte Membrane Fuel Cell Applications

Towards Low-Resistance P-Type Contacts to 2D Transition Metal Dichalcogenides Using Plasma-Enhanced Atomic Layer Deposition

Selective Passivation of 2D TMD Surface Defects by Atomic Layer Deposition for Enhancing Recovery Rate of Gas Sensor

Beyond the conventional AB process: Advanced ALD approaches for controlling the properties and growth of MoS₂ and WS₂ 2D Materials

Deposition and Characterization of Transition Metal Oxide/2d Transition Metal Dichalcogenide Quantum Wells

Engineering Al₂O₃ Interlayer via Atomic Layer Deposition for Enhancing Contact Properties of MoS₂-Based FET