ALD/ALE 2026 Monday Afternoon

Two Level Systems Mitigation by Atomic Layer Deposition for Quantum Application

Atomic Layer Deposition Based Dopant Engineering of Er-Doped CeO₂ Thin Films for Scalable Quantum Materials

Superconducting Nitrides by Fast Remote Plasma ALD for Quantum Applications

Wafer-Scale Thermal ALD of Superconducting TiN: A Scalable Process with Room-Temperature Predictive Mapping

ALD Outstanding Presentation Award Finalist: Growth of Superconducting Trilayer NbN/AlN/NbN Structures for Photonics and Quantum Computing Applications

Bridging Code and Chemistry: The Origin of Precursor Decomposition

Multi-Objective Discovery of New Precursors for ALD with Steerable Generative AI

First-Principles Screening of Precursors and Inhibitors to Achieve Enlarged-Grain MoS₂ Through Area-Selective Deposition

Molecular–Level Insight Into Thermal Stability and Substrate–Dependent Nucleation of DDAP for Platinum ALD

Theoretical Analysis on Organic Sulfur Sources for Atomic Layer Deposition of MoS₂

A Data-Science Approach to the Analysis of Temperature-Dependent Alumina Atomic Layer Deposition Growth Per Cycle

Physics-Informed Bayesian Active Learning Framework for Efficient Precursor Pulse Time Tuning in Atomic Layer Deposition

To ALD or Not to ALD on Lithium? Controlling Growth Through Plasma Pretreatments

Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High-k Rutile Capacitors

Atomic Layer Deposition of Ultrathin Topological Semimetals with Thickness-Dependent Resistivity

Metal-polar AlN and GaN Atomic Layer Etching using SF₆ and Cl₂/BCl₃ Plasma

Thermal Atomic Layer Etching of Magnesium Oxide Using Hydrochloric Acid and Acetylacetone or Tetramethylethylenediamine

Atomic Layer Processing of Electronic Devices

Plasma-Enhanced Atomic Layer Etching of Mbe- and Ald-Grown Ultrathin HZO for Ferroelectric Tunnel Junctions

Atomic Layer Etch Process for Nb and Ta Using CF₄/H₂ Plasma

Uncovering Plasma-Enhanced Atomic Layer Etching of Silicon Nitride Using Molecular Dynamics Simulations with Machine Learning Force Fields

Comparative Study on Atomic Layer Etching Characteristics of Conventional C₄F₈ and Low-GWP C₃F₆

From Inverse Design to Thin-Film Growth: AI-Guided Discovery of ALD Dielectrics

Spatial ALD of Zinc Tin Oxide by Co-Dosing and Supercycles: The Role of Persistent Ligands

Atomic Layer Deposition of Epitaxial Complex Oxides for Neuromorphic and Photonic Applications

Towards Fast-Growing Metal Phosphate Films with Controlled Stoichiometry Using Plasma-Enhanced ALD

Uncovering Emergent Electrical Behaviour in ALD Nanolaminates Through Supercycle Engineering for SiC Gate Applications