AVS2008 Friday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Friday, October 24, 2008
8:20 AM 9:20 AM 10:20 AM
BO+
Photo-Patterned SAMs on Au(111) and SiOx: An XPS Investigation
Odd-Even Efect in Molecular Packing and Stability of ω-Biphenyl-Alkane-Selenol SAMs on Au(111)
Self-Assembly of Methanethiol on the Reconstructed Au(111) Surface
Thermo Scientific Theta Probe : Measuring the Quality of Self-Assembled Monlayers on Gold
Morphology and Bonding in Alkene and Alkyne Based Monolayers Chemomechanically Formed on Si Surfaces
NS+
Synthesis of Controlled (/n,m/) Identity Single-Walled Carbon Nanotubes
Fullerene Growth on N-adsorbed Cu(001) Nanopatterned Surfaces
Nanochemical Equilibrium Involving a Small Number of Molecules: a Prediction of a Distinct Confinement Effect
Epitaxial Growth of InP Nanowires on Silicon
Structure and Electron Transport within Self-Assembled Monolayers (SAMs) of Discotic Molecules on Au-substrates
Nanoscale Ballistic Heat Conduction in Silicon
Understanding the Factors Driving Performance and Reproducibility for Spray-Coated Single Wall Carbon Nanotube Transparent Conductive Films
Electron Beam Irradiation Induced Mass Transport in Indium Filled Indium Oxide Tubular Nanoarrow Structures
Etch Stop Control and Low-Damage Atomic-Layer Etching of HfO22 using BCl3 and Ar Neutral Beam
Assessment and Characterization of Exposures to Airborne Nanoparticles at Research Centers
PS1-FrM
Effect of Annealing Temperature on the Response of HfO2 to Vacuum Ultraviolet Radiation
Response of BEOL Dielectrics to VUV Radiation
Mechanism of Plasma Ashing Damages on Porous SiOCH Films
Surface Modifications of Ultralow Dielectric Constant Materials Exposed to Plasmas under Sidewall-like Conditions
Degradation Mechanisms of Structure and k Value of Low-k Film by Plasma Irradiation
Study of SiOxFy Passivation Layer Deposited in SiF4/O2 ICP Discharge used in Cryogenic Alternated Etching Processes
Anisotropic Fluorocarbon Plasma Etching of Si/SiGe Heterostructures and Induced Sidewall Damage
Influences of Electrical Characteristics in Carbon Nanotubes by Neutral Beam Irradiation
Surface Modification of PTFE Surfaces with Post-Discharge RF Plasmas Operating at Low and Atmospheric Pressure
CoSix Damage in Etching and Ashing Plasma
PS2-FrM
Silicon Oxide Sidewall Passivation during HBr Inductively Coupled Plasma (ICP) Etching of InP and GaAs Materials for the Fabrication of Photonic Devices
Low Bias Inductively Coupled Plasma Etching of CdHgTe in CH4/H2 Based Chemistry
Characterisation of InP Ridge Sidewalls Patterned in Inductively Coupled Halogen Plasmas
The Plasma Polymerization of Novel Metal Containing Monomers Via Sublimation of the Precursor Materials
Advancement and Characterization of 3D TSV Etch Applications
Investigation of Bottom Profile Degradation Mechanism in Extremely High-Aspect-Ratio Feature Etching
Through Silicon Via Etching for 3-D Interconnection using Pulse Inductively Coupled Plasma
SE+
On the Plasma Parameters in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS)
Deposition of Metal Oxide Coatings using Reactive High Power Impulse Magnetron Sputtering
A Mass/Energy Analysis of the Plasma during Modulated Pulse Power Sputtering
Process, Structure and Properties of Chromium and Chromium Nitride Coatings Synthesized using Modulated Pulse Power (MPP) Sputtering
Deposition Rate of High-Power-Pulse Magnetron Sputtering Processes
Effects on Thin Film Growth Due to Anomalous Transport in High Power Impulse Magnetron Sputtering
High Power Impulse Magnetron Sputtering of Ti-Si-C Multifunctional Thin Films
Modulated Pulse Power Deposition of Aluminum Oxide Nanometer Scale Multilayer Films
The Specification and Optimization of HIPIMS Power Supply Parameters
SS+
Heterogeneous Reactivity of O3 and OH Radical with Potassium Iodide
Reactivity of Fe0 Atoms, Clusters and Nanoparticles with CCl4 Multilayers on FeO(111)
New Paradigms for Environmental Surfaces: Structure and Reductive Transformation at α-Fe2O3/Water Interfaces
Molecular Beam Studies of Supercooled Mixtures of Methanol and Water
DFT Study of Water Adsorption on SrTiO3 (001) Bulk Termination and 2x1 Reconstruction
Unraveling a Reaction on an Oxide Surface Step by Step: Formation of Water from Oxygen through Successive H Transfer Reactions on TiO2(110)
Water Dissociation on Single Crystalline Anatase TiO2(001) Studied by Core Level Photoelectron Spectroscopy
Study of the Oxidation of Titanium and the Adsorption of Biomolecules on Titanium by Means of Electrochemical Quartz Crystal Microbalance with Dissipation Supported by X-ray Photoelectron Spectroscopy
Acidic Dissolution Mechanism, pH-dependent Stabilization and Adhesion of Single Molecules on Single Crystalline ZnO(0001)-Zn Model Surfaces Studied by in-situ AFM and DFT Simulations
The Adsorption of Water on a PdO(101) Thin Film on Pd(111)
SS+
From Nanochemistry to Active Nano-Objects at Semiconductor Surfaces
Chemistry of the Si-rich β-SiC(100) Surface Compared to the Si(100) Surface
Surface Band Bending in GaN
An Accelerated Molecular Dynamics Study of Diffusion on the GaAs (001) β2(2x4) Reconstruction
First Principles Investigation of Dimer Ordering on III-V Semiconductor Surfaces
Hydroxyl Termination and Passivation of the Group III-rich (4x2)/c(8x2) Surfaces of InAs(001) and InGaAs(001) Surface Studied by STM, STS, and DFT
Pit Nucleation in the Presence of (nx3) and β2(2x4) Surface Reconstructions on In.81Ga.19As/InP Films
In-situ ALD Studies of Al- and La-oxide on In0.53Ga0.47As
Atomic Scale Investigation of Mn Impurities on the InAs(110) Surface
Sessions | Time Periods | Topics | Schedule Overview