The mechanisms leading to spin relaxation in graphene and its heterostructures continue to be debated. Control of the spin relaxation in graphene-based structures is necessary to achieve the envisioned utility of graphene in future spintronic devices beyond Moore’s law. Proximity induced spin relaxation caused by contact to a high spin-orbit material, such as WS₂, offers a promising avenue to manipulate the spin lifetime [1]. We demonstrate the operation of WS₂/graphene/fluorographene non-local spin valves and extract the spin lifetimes for a range of carrier concentrations by Hanle effect measurements. Four-terminal charge transport measurements allow us to calculate the momentum relaxation time as a function of carrier concentration and compare it to the spin lifetime. These data show that the D’yakonov-Perel’ mechanism is the dominant spin relaxation mechanism for WS₂/graphene/fluorographenedevices, while, for reference graphene/fluorographene devices, linear scaling between the spin and momentum lifetimes points to spin-flip scattering during strong elastic scattering events where the scattering event is strongly coupled to the electron spin. We attribute the change in spin relaxation type in part with the inclusion of WS₂ as a substrate to proximity induced spin-orbit coupling due to the adjacent WS₂ layer, and we compare our data to the literature.

[1] A.L. Friedman, et al. Carbon 131, 18-25 (2018).

Quantum dots in graphene have been mostly realized by etching. This leads to localized states at the uncontrolled edges dominating the transport properties of these quantum devices. [1] It is well known that in bilayer graphene gaps can be opened by vertical electrical fields. [2] This approach has been used with limited success to define quantum devices [3]. The pinch-off characteristics are typically limited by leakage currents often thought to occur at the physical sample edges [4].

Here we demonstrate that electrostatically tunable barriers can be fabricated on bilayer graphene devices with graphite as a back gate. We measure pinch-off resistances exceeding GOhms and observe quantized conduction plateaus for one-dimensional constrictions. [5] With suitable gate arrangements few carrier hole and electron quantum dots can be electrostatically defined. We measure the controlled occupation of quantum dots with single holes and electrons. Four-fold level bunching is observed in Coulomb blockade spectroscopy which is understood in terms of valley and spin states. Magnetic field dependence allows to investigate orbital and spin/valley degrees of freedom.

We further demonstrate quantum devices build on MoS2.

1. For a review see Bischoff et al., Applied Physics Reviews 2, 031301 (2015)

2. Oostinga et al., Nat. Materials 7, 151 (2007)

3. Allen et al., Nat. Comm. 3, 934 (2012)

4. [https://www.nature.com/articles/ncomms14552#auth-1] et al., Nat. Comm. 8, 14552 (2017)

5. Overweg et al., [https://arxiv.org/abs/1707.09282], [https://arxiv.org/abs/1709.00870]

Microdisplay with high resolution, brightness, and efficiency with long-term stability and reliability are highly required for advanced display technologies. Inorganic semiconductors LEDs best suits this purpose because they can emit very high density of light from a small area and they have very high efficiency and long-term stability. To use inorganic LEDs for display applications, various lift-off and transfer techniques of inorganic thin films grown on single crystal substrates, such as sapphire or Si, were developed. However, achieving display devices using inorganic semiconductor thin films is still very challenging because of the limited size and high manufacturing cost of the single crystal substrates, as well as the complicated processes required for lift-off and assembly. To resolve this problem, growths of inorganic semiconductor nanostructures and thin films on graphene substrates have recently been proposed, since graphene has great scalability and extremely thin layered hexagonal lattice structure as an excellent substrate for GaN growth. Moreover, the inorganic semiconductors prepared on large-area graphene can be transferred easily to or grown on elastic substrates to meet the flexibility demand. Here, we suggest a method of fabricating ultrathin, high-resolution inorganic microdisplay based on individually addressable GaN microdisk LED arrays grown on graphene dots.

Here, we report on the fabrication and EL characteristics of ultrathin and individually addressable GaN microdisk LED arrays grown on graphene dots for microdisplay applications. GaN microdisks were prepared by epitaxial lateral overgrowth on patterned graphene microdots on SiO₂/Si substrates using MOVPE. After preparing the GaN microdisk arrays, p-GaN and InGaN/GaN multiple quantum well, and n-GaN layers were heteroepitaxially grown on the surface of the GaN microdisks. Ultrathin layers composed of GaN microdisk LED arrays on graphene dot were prepared by coating a polyimide layer and lifting-off the entire layers from the substrate. Then, single-walled carbon nanotubes (SWCNTs)/Ni/Au and SWCNTs/Ti/Au multiple electrode lines were formed on the top and bottom surface of GaN microdisk arrays in an aligned manner and crossing each other. The electrical and optical characteristics of the individually addressable GaN microdisk array on graphene dots were investigated by measuring their I–V curves and EL characteristics at various bending conditions. We also confirmed that the ultrathin micro-LED display worked reliably under flexible conditions and continuous operation mode.

As device dimensions shrink, surfaces and interfaces between materials make up a larger volume fraction of a device leading to degrading device properties in 3D materials. One solution is to use 2D materials, however these materials introduce additional challenges. For instance, high resistance Schottky barriers and a small number of free charge carriers in comparison to bulk materials. The effective mobility of field effect transistors (FETs) based on two-dimensional (2D) single-layer transition metal dichalcogenide (TMD) films is frequently limited by barriers at the contacts, as opposed to the native properties of the TMD material. Specifically, high resistance Schottky barriers form at the TMD/metal interface because of the film’s thinness and resulting small number of carriers. Here we demonstrate a scalable single-step deposition method for nanoscale hybrid 2D/3D TMD structures encoded by lithographic patterning prior to deposition. By confining the metal contact to the bulk regions of WSe₂, the effective mobility is increased to nearly 100 cm²V^-1s^-1 with an on/off ratio >10⁵ for bottom-gated devices (through 300nm of oxide), even for comparatively long channels (>5 microns) and absent other contact optimization. Our process involves lithographic patterning of a hafnium (IV) dioxide film onto the SiO₂/Si substrate prior to TMD growth. Bulk-like 3D WSe₂ is observed to grow at the location of the hafnia, while 2D single-layer material is grown in regions of bare SiO₂. Systematic evaluation of transport data allows us to extract Schottky barrier heights and other fundamental properties of our hybrid devices. We demonstrate that this process can be used to create devices with metal/3D TMD contacts, which exhibit a reduced Schottky barrier height, while continuing to use 2D TMD channels, which result in an excellent on-off ratio.