AVS 68 Plasma Science and Technology Division Sessions
Topic Abstract Book
(1 MB, Nov 18, 2022)
Topics
| Time Periods
| Schedule Overview
Click a Session Code to view its Abstracts
| Session Code | Start | Session Name |
|---|---|---|
| PS-MoM | Monday, November 7, 2022 8:20 AM | Plasmas for the Environment and Sustainability: Plasmas-Liquid Interactions, Water, Air, Soil Treatment |
| PS+AS-MoA | Monday, November 7, 2022 1:40 PM | Plasma Chemistry and Catalysis |
| PS1+NS-TuM | Tuesday, November 8, 2022 8:00 AM | Advanced Plasma Patterning: EUV-Based, Multipatterning and Alternative Patterning Approaches (Imprint, DSA, Etc.) |
| PS2+MS-TuM | Tuesday, November 8, 2022 8:00 AM | Modelling of Plasmas and Plasma Driven Processes, and Machine Learning |
| PS1+TF-TuA | Tuesday, November 8, 2022 2:20 PM | Plasma Processing for Advanced Emerging Memory Technologies, Advanced Packaging and Heterogeneous Integration |
| PS2+AS+SS-TuA | Tuesday, November 8, 2022 2:20 PM | Plasma-Surface Interactions |
| PS-TuP | Tuesday, November 8, 2022 6:30 PM | Plasma Science and Technology Poster Session |
| PS1+AP+TF-WeM | Wednesday, November 9, 2022 8:00 AM | Plasma Deposition and ALD Processes for Coatings and Thin Films |
| PS2+TF-WeM | Wednesday, November 9, 2022 8:00 AM | Plasma Processes of Non-Silicon Related Semiconductors for Energy-Efficient Devices in Power, Photovoltaics and Optoelectronics Applications |
| PS1+AP-WeA | Wednesday, November 9, 2022 2:20 PM | Plasma Assisted Atomic Layer Etching |
| PS2+SE-WeA | Wednesday, November 9, 2022 2:20 PM | Atmospheric Pressure Plasmas and their Applications |
| PS-ThM | Thursday, November 10, 2022 8:00 AM | Plasma Processing for Advanced Semiconductor Devices |
| PS-ThA | Thursday, November 10, 2022 2:20 PM | Harnessing the Power of Plasmas for Real-World Applications: PSTD Award Lectures |
| PS2+SE-FrM | Friday, November 11, 2022 8:20 AM | Plasma Sources, Diagnostics, Sensors and Control |
| PS1+MS+SS-FrM | Friday, November 11, 2022 8:20 AM | Modelling of Plasmas and Plasma Driven Processes, and Plasma-Surface Interactions II |