ALD Preparation of TiO₂-MnO_x/SiO₂ Catalyst for Selective Catalytic Reduction of Nitrogen Oxides

Unravelling the Mechanism of Electrochemical Activation of ALD Cobalt Phosphate by Digital Control Over Its Chemical Composition

Increasing ALD Complexity: How to Transform Ternary Oxide Films Into Tunable Bimetallic Thin Films and Nanoparticles

Tunable TiO₂-BN-Pd Nanofibers by Combining Electrospinning and Atomic Layer Deposition to Enhance Photodegradation of Acetaminophen

Ultra-Low Dimensional Ir-Ru Thin-Film by Atomic Layer Deposition on Porous Titanium Felt Substrate for Electrochemical Water Splitting Application

Influence of Co/Ni Ratio on OER-catalytic Performance of Atomic Layer Deposited Nickel Cobalt Oxide

Fundamental Studies of s-ALD Grown Iridium Thin Films on Planar Substrates for Acidic Water Splitting

Functionalization of MoS₂ With Noble Metal by Atomic Layer Deposition for Hydrogen Evolution Reaction

Conversion Reactions and Redox Changes on the Surface of Lithium-Ion Battery Cathode Materials during Chemical Vapor Treatment for ALD

Titanium Carboxylate MLD Hybrid Films as Protective Coatings for Lithium-Ion Batteries

Surface Coating and Grain Boundary Engineering of NMC811 Materials for Next-Generation Li-Ion Batteries

Hybrid Inorganic/Organic Polycarbonate Track-Etched Membranes With Tunable Pore Size and Surface Functionality for Redox Flow Batteries

TiO₂ ALD Thin Films Characterization for SiC Capacitor

ALD Can Enable Competitive, U.S.-Sourced Graphite Production

Plasma-Enhanced Atomic Layer Deposition of Nickel and Cobalt Phosphate for Lithium Ion Batteries

Atomic Layer Deposition of CsI and CsPbI₃

Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of Structure and Thermal Properties as ALD Precursors

SnO Thin Films via Water Based ALD using a Sn(II) Precursor: Precursor Evaluation and ALD Process Development

Tuning the Texture of ZnO Thin Films Through the Addition of a Volatile Shape-Directing Agent in the AP-SALD System

Recent Advances in Rare Earth Precursors for ALD

Novel Growth Inhibitor in Atomic Layer Deposition for Conformal Coverage on High Aspect Ratio Trenches

Solution ALD: A Versatility Process for the Growth of Sulfides and Selenides

Flash-Lamp Enabled Atomic Layer Deposition

A User Experience Feedback on Numerical Simulation for CVD/ALD Precursor Design & Development

What Is the Reactivity of a Precursor in ALD? - Simulation of Growth and Etch Rates

Random Sequential Adsorption and the Consequences for the Growth-Per-Cycle of Atomic Layer Deposition Processes

Machine Learning Based Atomistic Modeling of ALD Processes

Modelling Ruthenium Deposition in Atomic Layer Deposition of Ru-doped TaN

Revisited Thermal and Plasma Enhanced Atomic Layer Deposition Processes of Metal Nitrides

Plasma-Enhanced Low-Temperature ALD Process for Molybdenum Oxide Thin Films and Its Evaluation as Hydrogen Gas Sensors

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Crystalline Tin Disulfide Thin Films

Leveraging Non-Saturated Oxidation Conditions in Plasma-Enhanced Atomic Layer Deposition for Tuning Functional Properties of CoO_x Catalyst Layers

Low-temperature HfO₂/SiO₂ Gate Stacked Film Grown by Neutral Beam Enhanced Atomic Layer Deposition

Thickness Matters: Sintering Inhibition of Pt Nanoparticle Catalysts via Sequential Control of MgO Overcoats

Route to Low Temperature Area-Selective Atomic Layer Deposition of Ni

Hydrogen Plasma-Assisted Atomic Layer Deposition of sub-Nanometer AlO_x for Low-Impedance Contacts to GaN

Tunable Ti³⁺-Mediated Charge Carrier Dynamics of Atomic Layer Deposition Grown Amorphous TiO₂

Temperature-Time-Thickness (Ttt) Topography Maps: A Parameter Space Visualization Approach for ALD Processes

in situ TEM Study to Unravel Dynamic Processes during the Synthesis of Ultrathin Crystalline ALD Nanotubes

Chlorination and Ligand Addition for Thermal ALE of Metals

Thermal ALE of Molybdenum via Low Temperature Oxidation in Ozone and Wet Chemical Oxide Dissolution

Selective Thermal Atomic Layer Etching of CoFeB Over MgO by Sequential Exposure to Chlorine and Diketone

Ligand-Exchange and Etching Reactions between Metal Fluorides and Silane Precursors Containing Different Ligands

Thermal Atomic Layer Etching of Zinc Sulfide (ZnS) Using Sequential Al(CH₃)₃ and HF Exposures

Requirements Beyond Etch Per Cycle for Thermal ALE in Semiconductor Manufacturing

From Barrel to ALE: A Lifetime in Etch/A Material and System Design Perspective

Understanding the Self-limiting Behavior in Atomic Layer Etched HfO₂

Area-Selective Atomic Layer Etching of SiO₂ Using Silane Coupling Agent

Improving SiO₂ toSiN_x ALE Selectivity with Surface Pre-functionalization for SiO₂/SiN_x Stacks

Plasma-Assisted Atomic Layer Etching of Silicon Nitride with Unfragmented Fluorocarbons

Silicon Atomic Layer Etching with Surface Chlorination and Removal with Ar or He Plasma