ALD/ALE 2022 Tuesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, June 28, 2022
10:45 AM
AA1-TuM2
Plasma-assisted ALD of IrO2 for Neuroelectronic Applications
Atomic Layer Deposition (Ald) on 5-Aminosalicylic Acid for Delayed and Targeted Drug Release Treatment of Inflammatory Bowel Disease
Atomic Layer Deposition Enables Dimensionless, Biocompatible Encasings for Medical Implants Pro-Longing Their Lifetime
AA2-TuM2
High ALD Equipment and Precursor Demand and 5-Year Forecast Due to Continued Semiconductor Device Scaling and Fab Expansions
High-k Gate Dielectrics for ScAlN Barrier HEMT Structures
Ultra-thin High-κ Dielectrics Growth by ALD on MoS2
Fabrication of a MOSFET Based on ZnO Using an Atomic Layer 3D-printer
AF-TuM2
Theoretical Understanding on the Chemical Principles of Atomic Layer Deposition
A Study of Area-Selective TiO2 Deposition Using First Principles Based Thermodynamic Simulations
Chemistry of Plasma Enhanced Atomic Layer Deposition of Co using CoCp2 and Nitrogen/Hydrogen Plasma
Adsorption Mechanics of Trimethyl Metal Precursors on AlN, GaN and InN
ALE-TuM2
Atomic Layer Processing Approach for Achieving Abrupt Epitaxial Interfaces on AlN
Surface Modification for Atomic Layer Etching of TiAlC Using Floating Wire-Assisted Liquid Vapor Plasma at Medium Pressure
Sessions | Time Periods | Topics | Schedule Overview