ALD/ALE 2026 Tuesday Morning

Molybdenum Deposition Chemistry for Advanced Interconnects

Thermal Atomic Layer Deposition of Transition Metal Phosphide Thin Films for Interconnects

Low Resistivity Metallic Films by Thermal Atomic Layer Deposition Enabling Next Generation Interconnects

Investigating TaN-Doped Ru Film Using ALD and Pulsed CVD Process for Enhanced BEOL Interconnects Performance in Logic Device

Low-Resistivity Ruthenium Thin Films with Enhanced Surface Morphology via High-Temperature 6-Step Atomic Layer Deposition for Advanced Interconnect Applications

Atomic Layer Modulation for Compositionally Controlled Ruzno Films as Diffusion Barriers for Cu Interconnects

A 2-step Platinum Atomic Layer Deposition Process for Suppressing Interfacial Oxidation in Advanced Interconnect Applications

Sub-5 nm Indium Oxynitride Channel in Top-gated FETs Fabricated by PEALD for High-Performance 3D Transistor

V_Fb Control Technique of SiO₂/Dipole/HfZrO₂ Stack Structure Using New LaTiO and AlTiO Dipoles

Low-Temperature High-Pressure Deuterium Annealing for Defect Passivation in ALD-Deposited HfO₂ High-k Film

Infiltration of Porous SiOCH Thin Films by High-k Materials: Toward Nanocomposites with Enhanced Dielectric Properties

Electrical Characterization of High-k ALD TiO₂ on AlGaN/GaN HEMT Structures

Development in Thermal ALD Chemistry since 2010

Designing Stable Organosilane Precursors for High Quality Silicon Oxide

Development of Novel Liquid Zr Precursors with Excellent Thermal Stability for High-Temperature ALD Processes in Next-Generation DRAM Capacitors

A New Zinc Amidinate Precursor for Thermal and Plasma-Enhanced ALD of ZnO

Amidates and Dimethylaminopropyl Groups as Innovative Ligands: New Opportunities for Ru Precursors

Functional Precursor-Driven High-k Atomic Layer Deposition with Improved Throughput and Dielectric Performance

From Facile Routes for Mid-Valent Molecular Synthons to Vapor Phase Growth of Molybdenum-Based Thin Films

ALD on Particulate Materials: Applications & Scale-Up

Temperature-Variation Atomic Layer Deposition: A Strategy for Tuning Particle Size and Dispersion toward High-Performance Catalysts

Achieving Conformality in Fluidized Bed Atomic Layer Deposition on Ultrafine Cohesive Nanopowders

Atomic Layer DepositionEnabled Control of Densification and Grain Size in ZnO Ceramics

A Dry-Wet Quasi-ALE Approach for Transition Metals: Tungsten as a Model System

Smooth Post-etch Morphology in Ligand Assisted Molybdenum Wet Atomic Layer Etch

The Effect of the Angle of Incidence of Ions on Atomic Layer Etching

Ab Initio Modeling of Atomistic Diffusion of Halogen Species at the Etching Front

Quantum Chemistry Calculation for Predicting Salt By-Products in ALE Processes

Influence of Oxide Phase and Surface Facet on Atomic Layer Etching of High-k Metal Oxides

Modeling SiO₂ Atomic Layer Etching Using HF/NH₃ Co-Dosing

In Situ ALE/ALD Surface Engineering for Reduced Dielectric Loss in Superconducting Quantum Circuits

Fluorine-Free Thermal Atomic Layer Etching of ZrO₂ Using H₂O/SOCl₂ Chemistry for Damage-Free Etch-Back of High-k Dielectrics

Thermal Atomic Layer Etching by Halogenation and Ligand-Addition Using N-Heterocyclic Carbenes

Influence of Fluorination and Oxygenation Sources on the Thermal Atomic Layer Etching of MoS₂

ALD Outstanding Presentation Award Finalist: The Impacts of Organic Structures on the Sensitivity of Molecular Atomic Layer Deposited EUV Resist Thin Films

All-Dry-Processed Zn-Based Inorganic–Organic Hybrid Photoresists for EUV Lithography

Polyurea Molecular Layer Deposition using Low Melting Point Precursors for Use in Biosensor Design

Conformality of Molecular Layer Deposited Polyurea for Sidewall Passivation

Molecular Layer Deposition of Polyamide Membranes for Selective Water and Ion Transport

Cyclic Siloxane Precursor for Molecular Layer Deposition of Polymer Networks

Extreme Ultraviolet and Electron Beam-Induced Decarboxylation of Hybrid MLD Aluminum Oxalate Photoresists

Vapor Phase Infiltration as a Route to Precise Atom Number Cluster Synthesis and Cation Substitution

Activated Direct Reaction between Carbonyl Groups in Poly(Methyl Methacrylate) (PMMA) and Diethylzinc (DEZ) During Vapor-Phase Infiltration

Atomic Layer Processes for UV-Stable Polymers: Synergistic Effects of Infiltration and Deposition of ZnO

Vapor Phase Infiltration of ZnO Nanocrystals into Biodegradable Fibers for Dermatologic Applications