AVS 69 Friday Morning

Sessions | Time Periods | Topics | Schedule Overview

Hover over a paper or session to view details. Click a Session in the first column to view session papers.
Session Friday, November 10, 2023
8:20 AM 9:20 AM 10:20 AM
2D+
Stochastic Computing Enabled by 2D Memtransistors
Electrical Characteristics of Semi-Metallic 2H-NbSe2 for Scalable Interconnects
Magneto-Transport Measurement and Maximum Entropy Mobility Spectrum Analysis in Semiconductor Substrates for Graphene Growth
What Are 2D Materials Good for?
BREAK
The Study of Internal Ion Transport in Ionic CuInP2S6
AP+
Atomic Layer Etching of SiO2 via H2/SF6 Plasma and TMA
Area Selective Deposition of HfO2 on Oxide and Nitride Surfaces
Surface Functionalization of SiNx over SiO2 with Aldehydes to Enable Area-Selective Atomic Layer Deposition
Surface Reactions During Atomic Layer Etching of Platinum by High-Density Nitrogen-Oxygen Plasma and Organic Acid Vapor
Isotropic Plasma-Thermal Atomic Layer Etching and in-Situ Atomic Layer Deposition Passivation of Aluminum Films for Superconducting Quantum Devices
BREAK
AS+
Correlative Analysis Using Time-of-flight Secondary Ion Mass Spectrometry for Beam Sensitive Samples
Secondary Ion Mass Spectroscopy of Battery Surface and Interface Chemistry – Metrology and Applications
Characterizing Ion Distribution at the Solid-Electrolyte Interface in Solid-State Lithium Ion Batteries with ToF-SIMS
A Perspective on X-ray Photoelectron Spectroscopy (XPS) Peak Fitting, and Reporting of XPS Data Acquisition and Peak Fitting Parameters in the Literature
Unsupervised and Supervised Machine Learning Applied to ToF-SIMS of an Organic Matter-Rich Mudstone with Molecular Biomarker
BREAK
Probing Thin Film Interfaces at the Nanoscale by Low Energy Ion Scattering
The Effect of Instrument Settings, Sample Distance, and Tilt on TofsimsSecondary Ion Intensities
Evaluation of Unaltered and Irradiated Nuclear Graphite Surfaces through Integrated Traditional XPS and HAXPES Techniques
EM1+
Thin Film Challenges and Opportunities in a 3D-Evolving Memory Landscape
Patterning Challenges in the Era of Vertical Scaling
Plasma Etch Challenges and Innovations to Enable sub-26nm Pitch L/S Patterning with High-NA EUV
Area-Selective Deposition with Carborane and Aromatic Self-Assembled Monolayer Blocking Layers
BREAK
EM2-FrM
Enabling Novel Infrared (IR) Materials for Next-Generation Applications
HC+
CO Characterized Pt/Cu(111) Single Atom Alloy (SAA) for the Hydrogenation of Unsaturated Aldehydes
Efficient Catalyst and Protection Layer of Ni/α-Al2O3 Catalysts for Improved H2O/CO2 Reforming Reaction of CH4via Atomic Layer Deposition
Complementary Outer Atomic Layer Analysis of Catalyst Materials Using LEIS
Size-Selected Ptn Cluster Electrocatalysts for Alcohol Oxidation
Calorimetric Energies of Metal Atoms within Nanoparticles on Oxide and Carbon Supports: Improved Size Dependencies, Adhesion Energies and Trends versus Metal Element with the Spherical Cap Model
BREAK
IB1-FrM
An Air-Free Transfer Mechanism For FIB SEM
IB2-FrM
Correlative and In Situ TEM/APT Technique Reveals Insights into Early Oxide Film Formation in a High Entropy Alloy
Applications of Advanced Focused Ion Beam System to Energy Storage Materials
The Fabrication of Ruthenium single crystal specimen with Focused Ion Beam and Field Ion Microscopy for Atom Probe Tomography
BREAK
IB3-FrM
Modeling and Experimental Demonstrations of Ion-Solid-Gas and Photon Beam Interactions During Nanoscale Synthesis
Displacement Damage and Total Ionizing Dose Response of Ga2O3 MOSFETs
Helium Ion Microscopy for Morphological Analysis of Thrombi Extracted via Thrombectomy for Acute Stroke
MS-FrM
Energy Efficient Scaling in Microelectronics: Enabling a New Era in Computing for a Sustainable Future
Improving Asic Energy Efficiency from Systems to Silicon
Atomic Precision Advanced Manufacturing for Tunnel Field Effect Transistors
BREAK
Materials, Devices, and Packaging Opportunities Towards a Super Energy Efficient Future
PS+
EUV Lithography Patterning towards Devices Nano Scaling
Break Healing and LER Mitigation for Low Dose EUV Exposure
Carbon Resist Microlens Etching in DF-CCP CF4 Plasmas: Comparison between Modeling and Experiments
Investigations of Surface Reaction Mechanisms in Euv Induced Hydrogen Plasmas
Area Selective Processing Based on Physisorption to Improve Functions of Extreme Ultraviolet Resist
BREAK
Recent Advances in Ga2O3 Material Development at AFRL
Reverse Lift-Off Process to Avoid Sidewall Artifacts Resulting from Dry Etching “Challenging” Materials
Control of Ge/Si Core/Shell Nanoparticles Growth In Pulsed Nonthermal Plasmas
PS+
Electrolyte Engineering for Nitrogen Fixation by Plasma Electrolysis
Two Atmospheric Pressure Plasma Jets Driven by Phase-Shifted Voltages: A Method to Control Plasma Properties at the Plasma–Surface Interface
Plasma Chemistry in Atmospheric Pressure Gases and Liquids: Fundamentals and Novel Applications
Increasing Adhesion of Polyurethane Painting on Aluminum by Atmospheric Pressure Plasma Jet Treatment
BREAK
Fundamentals of Atmospheric Pressure Discharges for Plasma Catalytic Applications
Atmospheric Pressure Inductively Coupled Torus Torch System for 3D Printing the Silicon-Nanofiber (Si/CNF) Anodes for Li-ion Batteries
Design and Functionality of a Low-Frequency Pulsed Plasma System
TF+
Membrane Design by Atomic Layer Deposition
Ultrathin Transferable MOF/Polymer Janus Thin Films with Tunable Turing Morphologies
Growth of Metal-Organic Framework Thin Films by a Vapor-Assisted Conversion Method
Enhancing the Electrical and Optical Properties of Thermochromic VO2: The Impact of Nanostructuring and Gold Nanoparticles
Atomic Layer Deposition of Sn-doped MoO2 Electrode Films with Distorted Rutile Structure for High-performance TiO2-based DRAM Capacitors
BREAK
Area Selectivity and Crystallographic Orientation of Zif-8 Films Deposited by Molecular Layer Deposition
Electron-Beam Assisted Solvent-Free Bottom-Up Patterning of Zeolitic Imidazolate Frameworks
Al2O3 Atomic Layer Deposition on a Porous Matrix of Carbon Fibers (FiberForm) for Oxidation Resistance
Mesoporous UiO-66-NH2 Thin Film Growth on TiO2 Coated Fabrics Using Atomic Layer Deposition (ALD) for Enhanced Organophosphate Degradation
Sessions | Time Periods | Topics | Schedule Overview